ISO International Standard

Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

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Publication Date: 2022-06-15

Ref: ISO 23170:2022

stdNumber: 23170

Version: 1

Edition: 1

Pages: 29

$163.84

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ISO International Standard

Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

Purchase ISO Standard

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