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Surface chemical analysis — Analysis of metal oxide films by glow-discharge optical-emission spectrometry
$187.57 Add to cart
Surface chemical analysis — Analysis of metallic nanolayers on iron based substrates by glow-discharge optical-emission spectrometry
$163.84 Add to cart
Surface chemical analysis — Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry
$187.57 Add to cart
Surface chemical analysis — Atomic force microscopy — Guideline for restoration procedure for atomic force microscopy images dilated by finite probe size
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Surface Chemical Analysis — Atomic force microscopy — Procedure for in situ characterization of AFM probe shank profile used for nanostructure measurement
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Surface chemical analysis — Auger electron spectroscopy — Repeatability and constancy of intensity scale
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Surface chemical analysis — Auger electron spectroscopy — Reporting of methods used for charge control and charge correction
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Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
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Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Methods used to determine peak intensities and information required when reporting results
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Surface chemical analysis — Characterization of nanostructured materials
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Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1
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Surface chemical analysis — Data transfer format
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Surface chemical analysis — Analysis of metal oxide films by glow-discharge optical-emission spectrometry

Surface chemical analysis — Analysis of metallic nanolayers on iron based substrates by glow-discharge optical-emission spectrometry

Surface chemical analysis — Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry

Surface chemical analysis — Atomic force microscopy — Guideline for restoration procedure for atomic force microscopy images dilated by finite probe size

Surface Chemical Analysis — Atomic force microscopy — Procedure for in situ characterization of AFM probe shank profile used for nanostructure measurement

Surface chemical analysis — Auger electron spectroscopy — Repeatability and constancy of intensity scale

Surface chemical analysis — Auger electron spectroscopy — Reporting of methods used for charge control and charge correction

Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Methods used to determine peak intensities and information required when reporting results

Surface chemical analysis — Characterization of nanostructured materials

Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1

Surface chemical analysis — Data transfer format

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